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1 article(s) from Keller, Lukas

Pattern generation for direct-write three-dimensional nanoscale structures via focused electron beam induced deposition

Lukas Keller and
Michael Huth

Beilstein J. Nanotechnol. 2018, 9, 2581–2598, doi:10.3762/bjnano.9.240

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Figure 1: Block-flow diagram of the environment of the pattern generator program using input from a geometry ...

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Figure 2: Illustration of the three dimensional pitch Π_3D, projected in the x–z-plane: In every frame each ac...

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Figure 3: Visualization of the height-dependent deposition rate: The blue circles correspond to vertices defi...

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Figure 4: Schematic overview of the angle-sorted proximity avoiding algorithm (asPAA). a: In order to minimiz...

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Figure 5: Schematic overview of the best permutation proximity avoiding algorithm (bpPAA). The algorithm gene...

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Figure 6: Calibration of deposition speed parameters x_F und z_F. Shown is one deposition series from 52° tilte...

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Figure 7: Angle-test structure consisting of several elements. Each element has a vertical pillar and a tilte...

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Figure 8: Avoiding of proximity effects: A and B are 2 × 2 arrays of cubes resting on a short pillar. They ar...

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Figure 9: Comparison of the angle-sorted proximity avoiding algorithm (asPAA) and the best permutation PAA (b...

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Figure 10: Height correction: Both left images are taken from a 52° tilted view. (A) is deposited without heig...

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Figure 11: Array of trees, each consisting of a root and three branches. The roots of the trees of the second ...

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Figure 12: Buckyball structure in top and side view (52° tilted). Precursor: Me₃CpMePt(IV), normal mode.

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Figure 13: 2 × 2 array of nanotrees consisting of a root and branches deposited with the CoFe precursor and a ...

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Figure 14: Working principle of the simple shadowing algorithm. A plane is defined parallel to the opening of ...

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Figure 15: In order to investigate the shape of edge tips with different edge inclination, deposits like shown...

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Published 27 Sep 2018

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